Extreme ultraviolet (EUV) lithography is next generation lithography technology which is used in chip manufacturing, wafer fabrication, and other applications. The global extreme ultraviolet (EUV) lithography market is segmented on the basis of equipment and end user. On the basis of equipment, the global extreme ultraviolet (EUV) lithography market is segmented into mask, mirrors, light source, and others. On the basis of end user, the global extreme ultraviolet (EUV) lithography market is segmented into integrated device manufacturers (IDM), foundry, and others.
Growing adoption of smart phones, adoption of extreme ultraviolet (EUV) technology in foundries, growing investment and research & development activities related to extreme ultraviolet (EUV) lithography technology are the factors which drive the growth of global extreme ultraviolet (EUV) lithography market.
Market Dynamics
Growing research and development activities in extreme ultraviolet (EUV) lithography sector is expected to boost the growth of global extreme ultraviolet (EUV) lithography market over the forecast period. For instance, several foundries such as Samsung have moved extreme ultraviolet (EUV) lithography into production at both 7nm and 5nm, but now the industry is preparing for the next phase of the technology at 3nm and beyond. Moreover, Taiwan Semiconductor Manufacturing Company, Limited (TSMC) plans to continue expanding its use of extreme ultraviolet (EUV) lithography tools for its next-generation 3 nm (N3) node process.
Key features of the study:
- This report provides in-depth analysis of global extreme ultraviolet (EUV) lithography market size (US$ Million) and compound annual growth rate (CAGR %) for the forecast period (2021– 2028), considering 2020 as the base year
- It elucidates potential revenue opportunities across different segments and explains attractive investment proposition matrices for this market
- This study also provides key insights about market drivers, restraints, opportunities, new product launches or approvals, regional outlook, and competitive strategies adopted by the leading market players
- It profiles leading players in the global extreme ultraviolet (EUV) lithography market based on the following parameters – company overview, financial performance, product portfolio, geographical presence, market capital, key developments, strategies, and future plans
- Companies covered as a part of this study include Canon Inc., Samsung Electronics Co. Ltd, Toppan Photomasks Inc., Ushio, Inc., ASML Holding NV, NTT Advanced Technology Corporation, Nikon Corporation, Intel Corporation, and Taiwan Semiconductor Manufacturing Company Limited
- Insights from this report would allow marketers and management authorities of companies to make informed decisions regarding future product launches, product upgrades, market expansion, and marketing tactics
- The global extreme ultraviolet (EUV) lithography market report caters to various stakeholders in this industry including investors, suppliers, managed service providers, third-party service providers, distributors, new entrants, and value-added resellers
- Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the global extreme ultraviolet (EUV) lithography market
Detailed Segmentation
- Global Extreme Ultraviolet (EUV) Lithography Market, By Equipment :
- Mask
- Mirrors
- Light Source
- Others
- Global Extreme Ultraviolet (EUV) Lithography Market, By End User:
- Integrated Device Manufacturers (IDM)
- Foundry
- Others
- Global Extreme Ultraviolet (EUV) Lithography Market, By Region:
- North America
- By Equipment:
- Mask
- Mirrors
- Light Source
- Others
- By End User:
- Integrated Device Manufacturers (IDM)
- Foundry
- Others
- By Country:
- Asia Pacific
- By Equipment:
- Mask
- Mirrors
- Light Source
- Others
- By End User:
- Integrated Device Manufacturers (IDM)
- Foundry
- Others
- By Country:
- China
- India
- Japan
- Australia
- South Korea
- ASEAN
- Rest of Asia Pacific
- Europe
- By Equipment:
- Mask
- Mirrors
- Light Source
- Others
- By End User:
- Integrated Device Manufacturers (IDM)
- Foundry
- Others
- By Country:
- Germany
- Italy
- U.K.
- France
- Russia
- Rest of Europe
- Latin America
- By Equipment:
- Mask
- Mirrors
- Light Source
- Others
- By End User:
- Integrated Device Manufacturers (IDM)
- Foundry
- Others
- By Country:
- Brazil
- Mexico
- Argentina
- Rest of Latin America
- Middle East and Africa
- By Equipment:
- Mask
- Mirrors
- Light Source
- Others
- By End User:
- Integrated Device Manufacturers (IDM)
- Foundry
- Others
- By Country/Region:
- GCC Countries
- South Africa
- Rest of Middle East and Africa
- Company Profiles
-
- Canon Inc.*
- Company Overview
- Product Portfolio
- Financial Performance
- Key Strategies
- Recent Developments/ Updates
- Samsung Electronics Co. Ltd
- Toppan Photomasks Inc.
- Ushio, Inc.
- ASML Holding NV
- NTT Advanced Technology Corporation
- Nikon Corporation
- Intel Corporation
- Taiwan Semiconductor Manufacturing Company Limited.
“*” marked represents similar segmentation in other categories in the respective section.
