ACM Research, a global provider of semiconductor equipment, unveiled its first high-throughput Ultra Lith KrF track system to a major logic wafer fabrication facility in China. This advanced tool is built to improve the photolithography process, which is significant for producing integrated circuits used in various electronic devices.
The system consists of a flexible configuration with 12 spin coaters, 12 developers, along with 54 hot plates. It persists proprietary backside particle removal unit (BPRV) technology and an integrated wafer-scale outlier inspection (WSOI) unit for real-time process monitoring.
The platform reflects upon ArF track platform of ACM, which showcases successful demo-line process validation.
Its key features include:
- Expansion into front-end process equipment market with new KrF track system.
- High throughput capacity over-flooding 300 wafers per hour.
- Successful delivery to a major Chinese logic wafer fab customer.
- Utilization of proprietary technologies (BPRV and WSOI) for a seamless process management.
The new KrF track system of the company spreads product portfolio into mature-node lithography, strengthening its competitive landscape in semiconductor equipment market across China.
The new KrF track system reflects commendable technical advancements with throughput exceeding 300 wafers per hour, supported by a solid configuration of 12 spin coaters, 12 developers, along with 54 hot plates with advanced thermal modulation system. The inclusion of proprietary backside particle removal technology along with wafer-scale outlier inspection functionality further improves the performance and yield management capabilities of the system.
The launch of the product is strategical specification of ACM in the mature-node device market, which continues to represent a significant portion of global semiconductor production. By offering both ArF as well as KrF track systems, ACM can now provide more accurate lithography solutions to its customers, particularly in China where domestic equipment sourcing remains a priority.
According to coherent market insights, the semiconductor equipment market is expected to grow at a CAGR of 9.5% during 2025 to 2032. Currently, the market is at USD 105.32 Bn in 2025 and is expected to be around USD 198.92 Bn by 2032. the rapid technological advancement as well as the growing complexity of semiconductor manufacturing are the factors responsible for the growth of the market.
The timing is particularly important as mature nodes continue to see strong demand for applications in IoT, automotive, industrial sectors, etc. As leading-edge nodes receive more attention, the mature-node market holds robust volume production with more stable, long-term demand patterns. ACM's expansion into this segment diversifies its revenue streams and strengthens its competitive position against established players in the semiconductor equipment market.
Dr. David Wang, President and Chief Executive Officer of ACM said “The launch of ACM’s Ultra Lith KrF track system expands ACM’s presence in front-end process equipment and reflects our commitment to address a broader range of lithography challenges. KrF lithography remains essential for mature-node devices, which ACM believes represent a large and growing portion of global semiconductor output. By offering both ArF and KrF track systems, ACM enables seamless fab integration and greater manufacturing flexibility across diverse applications.”
Source:
Press Release: ACM Research
Company: ACM Research
