Applied Materials, Inc., a leader in materials for the semiconductor industry, has introduced new systems that improve the performance of advanced logic chips at 2 nm and smaller sizes. These new technologies make AI computing faster by enhancing the most basic part of chips, the transistor, on an atomic level.
The shift to Gate-All-Around (GAA) transistors is a big step in the industry and key to creating energy-efficient AI chips. As GAA chips at 2 nm become more common this year, Applied Materials is rolling out new materials to improve these next-generation transistors. These new chipmaking systems will help improve energy efficiency as the industry transitions to GAA technology.
At the core of GAA transistors are nanosheets, ultra-thin silicon layers that carry electrical current. To operate properly, these nanosheets must be perfectly smooth as well as free of any roughness or contamination, even at the atomic level. If the surface isn’t smooth, it can slow down the chip's performance. A clean, uniform surface makes the chip work faster and more efficiently.
The Applied Producer™ Viva™ system is designed to precisely treat the nanosheet surfaces. It uses a special technique that delivers ultra-pure materials to smooth out the surfaces without causing damage. This helps ensure uniform, efficient treatments inside the deep layers of the transistor, improving chip performance.
Executive Statement
According to Dr. Prabu Raja, President of the Semiconductor Products Group at Applied Materials, the rapid progress of AI is pushing compute performance to the limit, and breakthroughs in computing begin with the transistor. To keep pace in the angstrom era, Applied is delivering materials engineering breakthroughs that improve energy-efficient compute. Together, these new systems extend Applied’s longstanding leadership in driving major transistor and wiring inflections, while helping customers accelerate their chip roadmaps to keep up with the blistering pace of AI.
